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Metasurfaces have become a cornerstone of modern nanophotonics and optical engineering, enabling unprecedented control over the amplitude, phase, and polarization of light. Electron beam lithography (EBL) plays a crucial role in their fabrication, offering the precision required to pattern their intricate designs.
However, scaling metasurfaces to large areas is challenging due to limitations in standard trapezoidal shapes used by pattern generators and the GDSII format, originally designed for polygon-based, Manhattan-style layouts. Fracturing the lots of non-repetitive, curved, and rotated elements in metasurface designs lead to poor pattern fidelity and significant data overhead.
RAITH EBPG overcomes these limitations by supporting a diverse range of shape primitives, efficient handling of the primitives with Firebird technology, and leveraging algorithmic patterning. This method generates design data directly in the machine format (GPF), bypassing time-consuming data handling and intermediate GDSII conversions. Moreover, RAITH VOYAGER introduces Algorithmixx, a streamlined workflow designed for efficient handling of complex layout that cannot be exposed by normal exposure modes.
In this webinar Dr. Frank Nouvertné, product manager EBL, and Dr. Michael Kahl, principal engineer global applications, give an insight in RAITH’s advanced EBL solutions for exposure of complex layouts with lots of non-Manhattan shapes, such as metasurfaces. All questions will be answered in a Q&A session after the webinar. |
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